Thermally-stable photo-curing chemistry for additive manufacturing by direct melt electrowriting
Version 2 2024-06-03, 10:37
Version 1 2022-03-01, 00:00
journal contribution
posted on 2024-06-03, 10:37 authored by A Daneshfar, LF Dumée, TC Hughes, Lingxue KongLingxue KongThermally-stable photo-curing chemistry for additive manufacturing by direct melt electrowriting
History
Related Materials
- 1.
Location
Amsterdam, The NetherlandsLanguage
EnglishPublication classification
C1.1 Refereed article in a scholarly journalJournal
Additive ManufacturingVolume
51Article number
ARTN 102623Pagination
1-13ISSN
2214-8604eISSN
2214-8604Publisher
ElesevierUsage metrics
Keywords
BLOCK-COPOLYMERSCINNAMOYLCROSS-LINKINGCRYSTALLIZATION KINETICSCYCLOADDITIONSEngineeringEngineering, ManufacturingMaterials ScienceMaterials Science, MultidisciplinaryMelt electrowritingMEMORYMorphologyNETWORKSPhoto cycloadditionPOLYMERRandom copolymerScience & TechnologySEPARATIONSTYRENETechnologyThermo-rheological properties4014 Manufacturing engineering4016 Materials engineering
Licence
Exports
RefWorks
BibTeX
Ref. manager
Endnote
DataCite
NLM
DC