Thermally-stable photo-curing chemistry for additive manufacturing by direct melt electrowriting
Version 2 2024-06-03, 10:37
Version 1 2022-02-05, 22:13
journal contribution
posted on 2024-06-03, 10:37 authored by A Daneshfar, LF Dumée, TC Hughes, Lingxue KongLingxue KongThermally-stable photo-curing chemistry for additive manufacturing by direct melt electrowriting
History
Journal
Additive ManufacturingVolume
51Article number
ARTN 102623Pagination
1-13Location
Amsterdam, The NetherlandsPublisher DOI
ISSN
2214-8604eISSN
2214-8604Language
EnglishPublication classification
C1.1 Refereed article in a scholarly journalPublisher
ElesevierUsage metrics
Keywords
BLOCK-COPOLYMERSCINNAMOYLCROSS-LINKINGCRYSTALLIZATION KINETICSCYCLOADDITIONSEngineeringEngineering, ManufacturingMaterials ScienceMaterials Science, MultidisciplinaryMelt electrowritingMEMORYMorphologyNETWORKSPhoto cycloadditionPOLYMERRandom copolymerScience & TechnologySEPARATIONSTYRENETechnologyThermo-rheological properties4014 Manufacturing engineering4016 Materials engineering
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