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Thermally-stable photo-curing chemistry for additive manufacturing by direct melt electrowriting
journal contribution
posted on 2022-03-01, 00:00 authored by A Daneshfar, Ludovic DumeeLudovic Dumee, T C Hughes, Lingxue KongLingxue KongThermally-stable photo-curing chemistry for additive manufacturing by direct melt electrowriting
History
Journal
Additive ManufacturingVolume
51Article number
ARTN 102623Pagination
1 - 13Publisher
ElesevierLocation
Amsterdam, The NetherlandsPublisher DOI
ISSN
2214-8604eISSN
2214-8604Language
EnglishPublication classification
C1.1 Refereed article in a scholarly journalUsage metrics
Categories
Keywords
BLOCK-COPOLYMERSCINNAMOYLCROSS-LINKINGCRYSTALLIZATION KINETICSCYCLOADDITIONSEngineeringEngineering, ManufacturingMaterials ScienceMaterials Science, MultidisciplinaryMelt electrowritingMEMORYMorphologyNETWORKSPhoto cycloadditionPOLYMERRandom copolymerScience & TechnologySEPARATIONSTYRENETechnologyThermo-rheological properties