Tuning Charge-State Localization in a Semiconductive Iron(III)–Chloranilate Framework Magnet Using a Redox-Active Cation

van Koeverden, Martin P; Abrahams, Brendan F; D’Alessandro, Deanna M; Doheny, Patrick W; Hua, Carol; Hudson, Timothy A; Jameson, Guy N L; Murray, Keith S; Phonsri, Wasinee; Robson, Richard; Sutton, Ashley L

Tuning Charge-State Localization in a Semiconductive Iron(III)–Chloranilate Framework Magnet Using a Redox-Active Cation

journal contribution

posted on 2020-01-01, 00:00 authored by Martin P van Koeverden, Brendan F Abrahams, Deanna M D’Alessandro, Patrick W Doheny, Carol Hua, Timothy A Hudson, Guy N L Jameson, Keith S Murray, Wasinee Phonsri, Richard Robson, Ashley L Sutton

Tuning Charge-State Localization in a Semiconductive Iron(III)–Chloranilate Framework Magnet Using a Redox-Active Cation

History

Journal

Chemistry of Materials

Volume

32

Issue

17

Pagination

7551 - 7563

Publisher

American Chemical Society

Location

Washington, D.C.

Publisher DOI

https://doi.org/10.1021/acs.chemmater.0c03132

ISSN

0897-4756

eISSN

1520-5002

Language

eng

Publication classification

C1.1 Refereed article in a scholarly journal

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Keywords

Science & Technology Physical Sciences Technology Chemistry, Physical Materials Science, Multidisciplinary Chemistry Materials Science METAL-ORGANIC FRAMEWORKS BIS(ETHYLENEDITHIO)TETRATHIAFULVALENE BEDT-TTF MIXED-VALENCE ELECTRICAL-CONDUCTIVITY ELECTRONIC-STRUCTURE CRYSTAL-STRUCTURE COMPLEXES SALTS DIFFRACTION OXIDATION

Tuning Charge-State Localization in a Semiconductive Iron(III)–Chloranilate Framework Magnet Using a Redox-Active Cation

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