Multilayer InSe-Te van der Waals Heterostructures with an Ultrahigh Rectification Ratio and Ultrasensitive Photoresponse

Qin, F, Gao, F, Dai, M, Hu, Y, Yu, M, Wang, Lifeng, Feng, W, Li, B and Hu, PA 2020, Multilayer InSe-Te van der Waals Heterostructures with an Ultrahigh Rectification Ratio and Ultrasensitive Photoresponse, ACS Applied Materials and Interfaces, vol. 12, no. 33, pp. 37313-37319, doi: 10.1021/acsami.0c08461.

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Title Multilayer InSe-Te van der Waals Heterostructures with an Ultrahigh Rectification Ratio and Ultrasensitive Photoresponse
Author(s) Qin, F
Gao, F
Dai, M
Hu, Y
Yu, M
Wang, LifengORCID iD for Wang, Lifeng orcid.org/0000-0002-9334-6873
Feng, W
Li, B
Hu, PA
Journal name ACS Applied Materials and Interfaces
Volume number 12
Issue number 33
Start page 37313
End page 37319
Total pages 7
Publisher American Chemical Society
Place of publication Washington, D.C.
Publication date 2020
ISSN 1944-8244
1944-8252
Keyword(s) Te
diode
heterostructure
multilayer InSe
photodetector
Science & Technology
Technology
Nanoscience & Nanotechnology
Materials Science, Multidisciplinary
Science & Technology - Other Topics
Materials Science
HIGH-PERFORMANCE
BLACK PHOSPHORUS
PHOTODETECTORS
HETEROJUNCTION
RESPONSIVITY
NANOSHEETS
Language eng
DOI 10.1021/acsami.0c08461
Indigenous content off
Field of Research 03 Chemical Sciences
09 Engineering
HERDC Research category C1 Refereed article in a scholarly journal
ERA Research output type C Journal article
Grant ID National KeyR&D Program of China (no. 2019YFA0705204)
National Natural Science Foundation of China (NSFC, no. 51802038)
hina Postdoctoral Science Foundation funded project (nos. 2019T120246 and 2018M630329)
Persistent URL http://hdl.handle.net/10536/DRO/DU:30142068

Document type: Journal Article
Collections: Institute for Frontier Materials
GTP Research
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