Atomic layer deposition of transition metal films and nanostructures for electronic and catalytic applications

Maina, James, Merenda, Andrea, Weber, M, Pringle, Jenny, Bechelany, M, Hyde, L and Dumee, Ludovic 2020, Atomic layer deposition of transition metal films and nanostructures for electronic and catalytic applications, Critical Reviews in Solid State and Materials Sciences, doi: 10.1080/10408436.2020.1819200.

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Title Atomic layer deposition of transition metal films and nanostructures for electronic and catalytic applications
Author(s) Maina, James
Merenda, AndreaORCID iD for Merenda, Andrea orcid.org/0000-0002-9998-0330
Weber, M
Pringle, JennyORCID iD for Pringle, Jenny orcid.org/0000-0002-2729-2838
Bechelany, M
Hyde, L
Dumee, LudovicORCID iD for Dumee, Ludovic orcid.org/0000-0002-0264-4024
Journal name Critical Reviews in Solid State and Materials Sciences
Total pages 22
Publisher TAYLOR & FRANCIS INC
Publication date 2020-01-01
ISSN 1040-8436
1547-6561
Keyword(s) Science & Technology
Technology
Physical Sciences
Materials Science, Multidisciplinary
Physics, Condensed Matter
Materials Science
Physics
Atomic layer deposition (ALD)
transition metals
nanostructures
electronic applications
catalytic applications
PLASMA ALD METHOD
THIN-FILMS
COPPER METAL
NI
GROWTH
NANOPARTICLES
CO
CU
ELECTROCATALYSTS
REDUCTION
Notes In press
Language eng
DOI 10.1080/10408436.2020.1819200
Indigenous content off
Field of Research 0204 Condensed Matter Physics
0913 Mechanical Engineering
0306 Physical Chemistry (incl. Structural)
HERDC Research category CN Other journal article
ERA Research output type C Journal article
Grant ID Australian Research Council for his Discovery Early Career Research Award (DECRA)
Persistent URL http://hdl.handle.net/10536/DRO/DU:30143438

Document type: Journal Article
Collections: Institute for Frontier Materials
GTP Research
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